The surface of the component is thoroughly cleaned and pretreated to remove contaminants such as oils, dust, and oxides. Proper surface preparation is crucial for ensuring strong adhesion and uniform coating thickness.

Cleaned parts are loaded into a vacuum chamber, which is then sealed and evacuated to create a low-pressure environment. Achieving high vacuum conditions minimizes contamination and allows for precise control over the deposition.

The coating material (often a metal or ceramic target) is vaporized using one of several methods—such as sputtering, arc evaporation, or electron beam evaporation. The material transitions from solid to vapor phase without passing through a liquid state.

Vaporized atoms or ions travel through the vacuum and are directed toward the substrate. This transport can be influenced by magnetic fields or electric potentials to control deposition uniformity and density.

The vaporized material condenses and forms a thin, dense, and adherent film on the substrate surface. The process parameters—such as temperature, pressure, and deposition rate—are carefully regulated to achieve desired film characteristics, including thickness, hardness, and morphology.